I suggest you to have a look at the following, interesting papers:
-The Effect of Sputtering Parameters on the Film Properties of Molybdenum Back Contact for CIGS Solar Cells
Peng-cheng Huang, Chia-ho Huang, Mao-yong Lin, Chia-ying Chou, Chun-yao Hsu, and Chin-guo Kuo
International Journal of Photoenergy, Article ID 390824 (2013)
Available at: https://www.hindawi.com/journals/ijp/2013/390824/
- Influence of sputtering parameters on microstructure and morphology of TiO 2 thin films
Seon-Hwa Kim, Yong-Lak Choi, Yo-Seung Song, Deukyong Lee, Se-Jong Lee
Materials Letters, 57(2), 343-348 (2002)
Available, as full texs on RG, at: Influence of sputtering parameters on microstructure and morphology of TiO 2 thin films
- Effect of sputter deposition parameters on the characteristics of PZT ferroelectric thin films
Zhenxing Bi, Zhisheng Zhang and Panfeng Fan
Journal of Physics: Conference Series 61 ,115–119 (2007)
Available at: https://iopscience.iop.org/article/10.1088/1742-6596/61/1/024/pdf
- The Effect of Sputtering Parameters and Doping of Copper on Surface Free Energy and Magnetic Pr operties of Iron and Iron Nitride Nano Thin Films on Polymer Substrate
Waheed Khan, Qun Wang, Xin Jin, and Tangfeng Feng
Materials (Basel), 10(2): 217 (2017)
Available at: https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5459117/
…..and a previous similar RG question, available at:
Dear Adam Weidling, thank you so much for your reply
I'm looking for experimantal magnetron sputtering process parameters (pressure, distance between target and substrate number of atoms injected inside the vacuum chamber, temperature....etc) and especially why choosen them with those values.
Abdelkader Bouazza I see, most times these parameters are chosen based on the end goal of the film. ie (desired crystal structure, surface roughness, density.. etc). I'd suggest looking at the Thornton Diagram (Thesis Tuning the thermal conductivity of polycrystalline films via...
) it shows how pressure and substrate temperature affect film microstructure. Many of these parameters, pressure, power, distance of substrate will determine how the ad atoms will interact with your sample. The rotation speed and pressure can have implications on coating uniformity especially when small features are being used for lift-off processes.