I wanted to grow the n and p type silicon nano wire on a silicon substrate using conventional chemical vapor deposition. I can deposit gold nano particles for the catalyst using DC sputtering. What will be the thickness of the gold thickness for micrometer long nano wires?
Good day!
I am not an expert on that field. However, I found an article, where authors deposited gold on glass by means of DC sputtering, reaching almost linear trend on gold deposition with 1 nm per 4.5-5 s.
Here's the link:
https://link.springer.com/content/pdf/10.1186/1556-276X-6-96.pdf
And as far as I understand, authors require 25 nm thickness of gold layer for the growth of silicon nanowires:
https://iopscience.iop.org/article/10.1088/0957-4484/17/12/012/meta
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