For defining new material in TCAD, the following sets of parameters need to be included such as bandgap (EG300), electron and hole density of states (NV300 and NV300), dielectric permittivity (PERMITIVITY) and electron and hole mobilities (MUN and MUP).
Can anyone please help me out for finding the above parameters for Niobioum Nitride (NbN) material? It will be immense help to carry forward my research.