I have heard in the past the long runs of HBr plasma in etch chambers will somehow impact the chamber and decrease the quality of results (inconsistent etch rate and etch profile) in the medium term. I believe I am currently observing this in my lab. However, since I do not remember the (and cannot think of a) mechanism via which HBr plasma etching could cause this kind of enduring issue, I cannot test to verify that it is the cause of my current issue and I do not know how to resolve the issue if so.
To be clear: I am not personally etching with HBr, but someone else is doing so and I suspect that it is causing our diamond etch quality to vary wildly, even after standard chamber clean.
Does anyone have any information on this subject?
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