As mentioned in your second question "straightforward vapor phase deposition".
Article Silane Deposition via Gas-Phase Evaporation and High-Resolut...
or for APTES
Article Statistical contact angle analyses: 'Slow moving' drops on i...
The mechanism is explained in
Article Analysis of silanes and of siloxanes formation by Raman spectroscopy
For treatment of a wafer APTES aminopropyltriethoxysilane is generally not recommended since it generally requires a hydrolysis condensation step. Aminopropyltrimethoxysilane reacts better under near anhydrous conditions in the vapor phase at >60°C. Cyclicazasilanes are extremely effective at room temperature, but they are always secondary amines. The following link may be helpful (see the application section on vapor phase deposition): https://www.gelest.com/themencode-pdf-viewer/?file=https://www.gelest.com:443/wp-content/uploads/Goods-PDF-brochures-couplingagents.pdf
"near anhydrous conditions" is really an interesting statement.
I strongly recommend to read the mentioned article in which the Kinetik of different methoxy and ethoxy silanes are measured and compared (especially figure 6).
Article Analysis of silanes and of siloxanes formation by Raman spectroscopy
Thank you for your comments. I recently tried
APTES (3-Aminopropyl)triethoxysilane) and 3-(Trichlorosilyl) propyl methacrylate in the vapor phase and I got 40 and 45 as their water contact angles. I am still looking for something with lower water contact angle like 30-35. Do you think using Aminopropyltrimethoxysilane will help to get a contact angle in the mentioned range? your responses are highly appreciated.
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