How to calculate the dose required for the lithography of the sample (composites or pristine sample)? Is it any theoretical formula based on thickness, materials, exposure time, distance between sample and UV source?
If you are using commercial photoresists then the manufacturer's datasheet gives you a table for typical doses (Joules/cm^2) required for critical dimensions, and for the different thicknesses of the resist. These numbers are typically for contact lithography. If the UV source that you use for lithography is set up in a constant intensity mode, then the source power supply should provide the intensity value (in Watts/cm^2). Usually the intensity value that is shown on the power supply is measured and calibrated such that it is the intensity that is available at the sample surface in the aligner.
You can then divide the recommended PR dose value by the UV lamp intensity value to obtain an exposure time in seconds.