Is there any possibility to get the Si/O atomic ratio of silicon rich oxide film prepared by reactive rf sputtering by means of evaluating the NIR-UV spectra?
Dear Lucie,
to get a quantitative answer on such stoichiometry ratio, XPS is the good technique.
I was suggesting XPS as it is a thin solid film prepared by rf sputtering.
No by NIR/UV.Sugest AAS or XRF analyse
Could you tell me some practical tips and instructions to provide the stokes - anti stokes measurements?
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