Can say by using UV mask writer be employed for this purpose? I have seen a paper on getting patterned graphene by depositing it on the patterned substrate using CVD. But can it be directly patterned on the substrate?
Hi Anvesh, I take it that you mean that you want to pattern graphene that is on a substrate. This should be possible using standard photolithography (combining the appropriate mask with negative or positive photo resist) for micron sized grapheme patterns. The exposed grapheme area following developing can be removed using an O2 plasma treatment.
Buttressing on Imalka's point. After the deposition of the graphene layer on a substrate, a photoresist (PR) layer will be deposited on the gràphene layer by spin coating technique. When this is acheived, Photolithography can then be performed, using a commercial aligner with 15 mW mm-2 of UV light exposure to form the patterns on the PR. Then you can follow the O2 plasma treatment procedure as suggested by Imalka.
Hi, I had one other doubt after this.
After doing O2 plasma treatment, how we can remove unexposed part of photoresist. If we use conventional method by using acetone to remove photoresist, graphene will also peel off from the surface. Is there any alternate method to do so ?
Hi Anvesh, generally, there would a strong interaction between the graphemes and the substrate. For example, if you look back at the pmma transfer technique, you would have an acceptable amount of success. The important bit would be how you would have transferred the graphebe to the substrate. A proper contact between graphemes and the substrate should ensure that the graphemes diesnt come off during subsequent processing
- Badges
- Science topic
- Similar topics
- Physical Sciences
- Materials Science
- Thin Films and Nanotechnology