Can someone please suggest a substrate which can be used to dropcast Silicon-Germanium nanoparticles on and then furnace annealed at 900degC.
Glass/quartz substrates melts at this high temperature and we might need something that does not alter properties of nanoparticle film at such high temperature like a metal substrate !!
Can anyone please suggest something?
Ta is good for annealing at these temperatures as S.N. has suggested. We use Ta substrate to anneal nanoparticles in our lab. I assume you will do the annealing in vacuum? Ta will begin to oxidize at temperatures greater than about 200-300 degC if heated in air.
You can use Tungsten (W) or Graphite plates as substrate,
I am sure it will fulfill your requirements. Its (W) melting point around 3422* C. You can use SiC also as substrate, Beside some oxide such as Al2O3 can resist at high temperatures.
i think you and Mr. Kunal Mondal, IIT Kanpurare doing same research work, . you can contact him. https://www.researchgate.net/profile/Kunal_Mondal_IITKanpur/
best wishes
Dear Pratik
Hi, i think you can use Al2O3 substrate,because this ceramic has higher thermal resistance than other materials.
I working with this material.
Gadolinium Gallium Garnet, or GGG (Gd3Ga5O12) substrates from integratedphotonics.com will be good up to at least 1000C. Also, sapphire, possibly.
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