I wanted to vary gas compsition during thin film deposition by using thermal mass flow controllers. Ex, I want to use pure Ar and pure O2 cylinders and MFCs to control and get desired composition (ex, 80% Ar and 20%O2) of the blend without using sophiscated equipments. I have this help only, can replace the Gas-mixture reservoir (at the bottom) with the deposition chamber ? Thanks in advance.
https://www.sierrainstruments.com/blog/?complete-guide-gas-mixing-blending-sierra-instruments&fbclid=IwAR1U_wRk-FqJ2X3sShVo1HFfia2jts7DZ3w7Z773BSLL8o2pfKag5ditGtc
Hi Abdul Quader!
Yes, of course you can! Remember the Avogadro's law and combined gas law. Everything iron works tested for centuries :)
Use two different MFC's for each of the gasses and feed them into the same gas supply line in the vacuum chamber (via T-coupling piece/Swagelock).
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