I am doing DFT calculations on defects (vacancies) in semiconductors. I need to calculate the formation energy for defects. I did some literature search, and found that most people use
the formula including atomic chemical potentials, but some others simply use E_defect=E_v-(N-n)/N*E_pc, with E_v the energy of the supercell containing vacancies, N the total number of atoms in a perfect supercell, n the number of vacancies, and E_pc the energy of the perfect supercell.
Could you explain what is the significance of these two, and the difference between them? Even in what kind of situation either of them should be applied?