It's possible, but costly. You would have to dedicate a large area with many layers and a very high k dielectric. Try working out the details with this formula:
C= k*Eo*A/D
C = Capacitance
k = Dielectric Constant of the layer between plates
Eo = Permittivity of free space = 8.854x10-12
A = Area in meters
D = Distance between plates in meters
You would need something like 1 square millimeter of plate area with 100 nanometer plate distance and dielectric constant of 1130 to get 100 nF. Vary the values as you wish, it's gonna be tough to dedicate that kind of space and if you get too close with the distance on the plate layers, your working voltage will go down and leakage will go up.
The answer is maybe BUT it really depends on the technology you are using as well as other requirement from the capacitor, working voltage, working temperature, ESR, leakage, etc.
It will require a large area and/or high dielectric material which may not be available or practical in the technology you are using.
If this is for manufacturing, large area capacitors will of course increase the price of the final design significantly AND effect the yield in the fab since larger capacitors are more likely to include a defect.
Thank you Robert C. Baumann. I have very little idea about chip design and would definitely like to know what is the highest capacitance value that can be embedded inside a chip conviniently? Will 100pF be a good value to fabricate?
Metal-silicon oxide-silicon structure is used in IC fabrication. Typical oxide thickness can be 0.001mm and area can be 1 mm*mm. Assuming a dielectric constant of 10, we can obtain, 88 pF capacitor. Further, these parameters can be tweaked to get the desired capacitance in pF range.
nF is unpractical to be implemented on chip. you can use techniques like "Miller capacitance multiplier" or "alpa block" to increase the capacitor to K ratio upto 1000. so you can integrate pF and have and effective capacitor in nF.
I simply need to see how power scales from 90 nm to 45 nm, and form 45 nm to 20 nm ( in case of SRAM). I am using ( P = CV2f) to estimate the power consumption of 20 nm SRAM compared to 90 and 45. I used Cacti to estimate the power of 90 nm and 45 nm but when I tried to estimate the power of 20 nm it gave an error ( maybe the 20 nm technology is not supported yet in this Cacti version)
By changing C, V, and f among the different technologies, I am trying to estimate the power scale.
Sorry for the unclear question and I hope this one is better.
U can use capcitance multiplier circuit. There are many different circuit topology in literature. İf you want to help about capcitance multiplier. i can help
When increasing the amount of capacitance in your IC design, The most important issue is the area that it occupies. In fact, if the area is not an issue, you can increase the amount of capacitance using "multiplier" option which multiplies the capacitor specified by a specific factor.