In my process, I want to remove amorphous silicon layer on multi-crystalline silicon surface. The setup I have is wet etching process. The recent data I have had shown HF+HNO3+H2O is not a good choice for me. Can anyone have a suggestion??
Carlos Araújo Queiroz
Please check the following related discussions for its possible interest: https://www.researchgate.net/post/Can_anyone_suggest_a_suitable_etchant_for_wet_etching_amorphous_Silicon https://www.researchgate.net/post/What_kind_of_solution_can_be_used_to_etch_amorphous_silicon
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