Thin films of Os metal can be prepared by thermal decomposition of an Os tetroxideolefin compound (see US Patent 3573970 A). Is there any reason that thick "films," say 1 mm+, could not be prepared in the same way, either by evaporating a large volume of the Os tetroxideolefin compound, or by repeated deposition of thin films?
Federico Brivio
I am not a Chemist, nor I am expert in the sector, but Osmim tetraoxide is one of the worst known compound. So I would be extremely careful to use solid Os.
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