Hi all,
according to your knowledge, does it exist a station for wafer processing that is able to mix and perform etching with piranha solution? At the moment, the solution and the etching is done manually. I would like to scale up it.
Ideally, in the station that I have in mind, there would be two tanks, one with H2SO4 and the other with H2O2 (and a third with DI water). At the right moment, the two chemical are mixed, then wafers loaded and etching performed (associated with a rinsing and drying after the etching).
After the etching the used piranha solution can be disposed in proper waste tank.
Do you know any company that produces this kind of station?
Many thanks,
Cosimo
See if they can serve your purpose:
https://www.puerstinger.com/products/special-equipment-and-parts/mix-system-for-caros-acid
- Badges
- Science topic
- Similar topics
- Correction