Dawuth Pathan

6 Questions 10 Answers 0 Followers

Questions related from Dawuth Pathan

Can PMMA be removal with AZ100 resist?

I want to do lift-off of samples fabricated with ebl and PMMA resist. Can I use AZ100 remover instead of acetone for liftoff?

21 May 2016 7,849 2 View

Can I use AZ5214E resist to fabricate devices using e-beam lithography (Raith 150 two) ?

I want to fabricate devices using ebeam lithography and AZ 5214E in Raith 150 Two system.

03 October 2015 5,073 3 View

Why is electron current saturating when CVD graphene is doped with aluminium?

I am trying to fabricate back-gated CVD graphene devices using photolithography(ppr S1813). I have done aluminium deposition to dope graphene n-type and shift dirac point of p doped graphene. I...

07 August 2015 9,571 1 View

How can I do passivation of CVD GFET devices fabricated using photolithography(LOR-3B and S1813 photoresist)?

I am using photolithography to fabricate CVD GFET devices. When I do electrical characterization it is giving large shift in Neutrality point. does anybody know how to passivate devices from...

17 May 2015 6,368 4 View

How can one remove PPR s1813 resist residues from graphene surface?

I am working on fabrication of CVD graphene FET. I am using PPR S1813 photoresist for lithographic process. I want to know different methods by which PPR s1813 residues can be removed from...

14 February 2015 4,432 10 View

How to restore dirac point shift in graphene devices?

I have been working on exfoliated graphene FET devices. When I fabricate devices and characterize them, dirac point shifts to very high voltages e.g., 80V. I have tried chloroform cleaning after...

01 February 2015 3,148 9 View