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I want to fabricate devices using ebeam lithography and AZ 5214E in Raith 150 Two system.
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I am trying to fabricate back-gated CVD graphene devices using photolithography(ppr S1813). I have done aluminium deposition to dope graphene n-type and shift dirac point of p doped graphene. I...
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I am working on fabrication of CVD graphene FET. I am using PPR S1813 photoresist for lithographic process. I want to know different methods by which PPR s1813 residues can be removed from...
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I have been working on exfoliated graphene FET devices. When I fabricate devices and characterize them, dirac point shifts to very high voltages e.g., 80V. I have tried chloroform cleaning after...
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