These 3 samples are all from TSS (T1=1400, t1=1min, T2=1250 t2=10 min with rate=10degC/min). I did thermal etching for three of them under same batch, i dont know why the images generated got so much different for sample 1&2 whereas sample 3 looks normal. I am thinking of etch and scan sample 1&2 again. Thermal etching was done at Temp=1350 degC, t=30 min, rate=10 degC/min.
* Is it because the thermal etching had induce grain growth to sample 1 & 2?
If the three samples have:
1- The same chemical and phase compositions.
2- The same history including the PSD of the starting material, the processing condition, thermal etching treatment, etc.
then it is recommended to worry about the temperature distribution in the furnaces. Sometimes, the large differences in the temperature, inside the furnace chamber, produces samples with different features although they have similar "apparent" history.
hi ivo, if you etch higher than the sintering temperature it is evident that there will be grain growth. for 3YTZP we typically etch at 5K/min to 1150-1200°C with 5-10 min dwell (cycle suitable for a HRSEM). Your materials are completely overetched, you should etch just enough to make the grain boundaries visible.
Frank
Imad Disher Frank Kern Thanks for your recommendation, I will take note, re-fabricate the samples and do the etching again carefully.
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