In XRD (even tho i did GI-XRD i got substrate peaks also in the patterns) patterns usually intensity of the substrate peaks should decrease with increase in the film thickness because of more reflections from the film than the substrate but in my case substrate peaks intensity increases(intensity of the film peaks also increases) with film (poly crystalline film) thickness

So what could be the reason for increase of substrate peaks intensity ? and apart from film thickness which factors( like porosity ,voids ,roughness etc) will effect the substrate peak intensity ? 

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