Hi, I coated (ethylmathacrylate-co-bezonephenol methacrylate) on the Si-wafer and cross-linked using UV(365 nm) for different time 5 min, 10 min, 1 h. It is supposed to uncross-linked polymer to be washed off completely. But, the polymer with 1 h UV it was not washed off completely with Toluene overnight. The polymer with 5 min was washed off mostly and small dots remains on the surface when I used toluene. My question is how can I remove un-crosslinked polymer from the surface.

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