Which photoresist is good for the planarization of the PEN plastic substrate? because my PEN has many scratches I want to make to smooth film for the device fabrication.
it would be great if you could provide photoresist spinning /annealing/crosslinking conditions?
Dear Sankara,
One of the best ways to remove the scratches and make the surface very flat you can use the polishing methods. You can get from the web the most suitable polish material and process for your material. There is also the chemical mechanical planarization CMP process. It may be useful for you also. It is used in the integrated circuit technology.
Best wishes
Dear Sankara,
One of the best ways to remove the scratches and make the surface very flat you can use the polishing methods. You can get from the web the most suitable polish material and process for your material. There is also the chemical mechanical planarization CMP process. It may be useful for you also. It is used in the integrated circuit technology.
Best wishes
Dear Sankara Rao Gollu,
Silane self-assembled monolayers modifying PEN substrates could solve the problem that you have. It is easy to do by dip-coating or vapor phases deposition. There are many references that you could find. Hope it helps.
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