Use FZ instead of CZ Material. The FZ has less impurities and less COP

http://www.siliconsultant.com/SIcrysgr.htm might be a good starting point

There are many kinds of physical and chemical deposition methods such as CVD and PVD are available for both film and bulk form semiconductors, but the important thing is that which purpose you are going to use your optimized and characterized semiconductor. the thickness of deposited film or pellet are principal features or not...

I agree with you. Indeed the question posed widely. Take, for example, the thin films of cadmium telluride or other absorbing layer in solar cells. Structural studies of semiconductor materials indicate the presence of a large number of intrinsic defects such as dislocations. Such defects strongly affect on the transport properties of semiconductor material. One way to optimize the electronic properties of those thin films is changing technological conditions of their growing. Another way - is to improve such properties for obtained films. What will be this way?

In the first way: you can use 1- thermal annealing (Oswald Ripening and Migration Coalescence) during which nucleation and growth can be controlled, 2- gettering for trapping impurities in the semiconductor through nanocavities.

In the second way, I think the SMART-CUT technology can help...