What is the minimum post-deposition annealing temperature required to achieve a highly crystalline ZnO and TiO₂ film on glass substrate, sapphire substrate using the thermal ALD process? In comparison to ALD, can the sputtering process achieve a highly crystalline, uniformly thick film across the entire substrate?
Ankita Chowdhury
Chaitanya Kumar Thank you, Sir, for your response. I have one doubt—by "thicker," do you mean a thickness greater than 100 nm?
0 votes
0 thanks
Ankita Chowdhury
Chaitanya Kumar
Thank you, Sir, for your response. I have one doubt—by "thicker," do you mean a thickness greater than 100 nm?
0 votes
0 thanks
w.s.l. Boyer
Hi Ankita, Chaitanya doesn't know because he just got the answer from ChatGPT.
Sputtering is often used to produce films 10 microns thick. It takes quite a while for that, but 100 nm - 1000 nm should be in the convenient range for sputtering.
0 votes
0 thanks
- Badges
- Science topic
- Similar topics
- Philosophy
- Philosophy Of Science
- Reasoning
More Ankita Chowdhury's questions See All
Similar questions and discussions