Film is highly crystalline in quality.
Article Direct-Vapor-Phase Grown $\hbox{IrO}_{2}$ Micronanostructure...
In a simple sense, etch rate is rate of the peeling off (removing) a compound or changing it into its elemental form from a surface either by some physical or chemical method. In the longitudinal sense, it is represented as:
E.R= D-Dt/t
Where D is the original length of the layer and D t is length removed (Angstroms) divided by the time taken (minutes).
Chemically, it is related to the reversible redox reaction.
In case of Ir2O3, the reaction is represented as:
Ir2O3+3H2O+6e ----- 2Ir+6OH (-); E=0.923V at Zero pH and 0.098V at pH=14.
We experimentally determine the potential and apply unitary method to calculate the mass of Ir2O3 which has been peeled off. Knowing the density, the volume and thickness of the layer, we calculate its length in Angtrom which on dividing by time (minutes) gives etch rate of Ir2O3.
A point left:
2IrO2+2H (+) +2e---------Ir2O3+H2O;E0=0.926V at pH=0 and =0.098V at pH=14.
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