I am going to spincoat PMMA on a silica substrate but don't know which is the best way, knowing that I am going to use different molecular weights?
The effect of varying concentration and spin speed on the thickness of spin-coated PMMA was discussed (for silicon wafers) at: D.B. Hall, P. Underhill, J.M. Torkelson, "Spin coating of thin and ultrathin polymer films", Polymer Engineering and Science, 38(12) 1998, 2039-2045:
http://onlinelibrary.wiley.com/doi/10.1002/pen.10373/abstract
About alternative sovents for PMMA, you may check: https://www.researchgate.net/post/With_PMMA_which_solvent_to_use
Thank you very much. I have already read the first one and I wanted to re-check and to see if another solvent besides toluene has been proved more effective .
I had bad experiences with fast evaporating solvents (low boiling point) for spincoating (rippling structures in spincoated film occurs). For me 2-ethoxy-ethylacetate gives good films (but there is some residual solvent in the spincoated film depending on film thickness > 1000nm which is removed by heating the wafer to about 120°C).
Thank you very much. Indeed, solvents with low boiling point are not that recommended in order to have uniform films.
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