I make silicon by magnesiothermic reduction. and I treat HCl to remove impurities. and will use etching solution(HF,nitric acid, etc...)
does anyone know best etching solution ratio(ex. WATER : ETOH: HF: HNO3: ACETIC ACID)??
We use AgNO3,HF,and H2O2 to each silicon.
The mixture of HF and HCl (1 : 19) gives good results
http://dx.doi.org/10.1063/1.114326
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