I have a sputtered Al layer, and want to know the etching rate in HCl at room temperature. All what I could find in literature were related with heated HCl bath, mainly 50 C.
You can find this kind of information in the big CRC handbook of metal etchants.
Link: http://vector.umd.edu/links_files/Handbook%20of%20Metal%20Etchants.pdf
Else, you can catalyze and accelerate the etching reaction of Aluminum by adding copper sulfate with HCl (Caution: the reaction is highly exothermic).
Kind Regards.
Hi Jerome,
thank you for the answer and the nice source! I will check it immediately.
Regards
Probably difficult to get a reproducible value for sputtered Al, because it will depend on the surface (roughness/purity) of the layer.
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