Actually, it is little confusing. When I wanted to try SiF4 gas for my experiment, I found out from literature that SiF4 is hazardous gas because it can easily react with water (humidity from air) to produce HF. If so the reaction would be:
SiF4 + 2H2O - - - - > 4HF + SiO2.
However, HF is usually used as an etching agent for SiO2. It means, HF+ SiO2---> SiF6 (-2) +H3O(+).
As an answer to your question, we can say that only H2SF6 solution is forming, unless you remove water from your system no SiF4 gas will evolve.
SiF4 is toxic and corrosive. In moist air it fumes, whereby it is easily hydrolyzed to give H2SiF6 and SiO2. However, in my opinion the most toxic / hazardous substance in this system is certainly HF. Utmost care must be exercised when working with HF, especially if it is a concentrated solution (40%) or even anhydrous. It easily penetrates the skin and can lead to serious injuries.