Do any one have experience/knowledge of MoS2 etchants, I looking for etchants of MoS2 (1-2 layers) grown on Sapphire, I am using photo resist as mask.
Dry and wet etching both are fine for my case(as my patterns of micro meter scale), In case of dry etchings, only CF4, SF6, O2 and Ar gasses are present in our laboratory RIE
You can use hot (*) sulfuric acid (≥10% w/w), aqua regia, chromic acid (≥10% w/w), mixed chromic acid and sulfuric acid (both ~10 % w/w; ~1:2 vol/vol), or conc. nitric acid, to etch (reactively dissolve) a molybdenum disulfide (MoS2) film over a sapphire substrate.
(*) warm if prepared with aerated or oxygenated water
Dear Khalil ,
you can use oxygen plasma with high power (500-1000 watt) for 10 min and it will removed totally.
Piranha worked very well for me.
My recipe:
Piranha -
96% sulfuric acid:30% hydroperoxide = 3:1
Hot plate temperature: 180C
Time: 10min
Maybe you can try lower temperature and less time. I don't know. I just tried this one and it worked well.
P.S.,
1. Sulfuric acid (32%) didn't work for me. (same temperature and time as above)
2. 200 Watt O2 plasma ashering (sample in Faraday cage, no bombardment) for one hour didn't work for me either.
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