I am a bit confused when reading about galvanostatic deposition. It appears that some people apply a current for a specific time (e.g. 20 mA for 40 seconds) and other people use current density (e.g. 20 mA/cm2, current per square centimeter). Are they both galvanostatic conditions ? Which is the correct way to state galvanostatic deposition conditions?
You can use current for a specific time and current density for a specific time, but current density is better parameter (you can calculate current for your sample with area = X --> current density=Current/X).
Most important is that if you know the current density, then you may directly calculate the amount of deposited material per area, i.e. you are able to predict a thickness of the deposit. This is not feasible, if only the current is given. Technically, howver, most galvanostats only allow to predefine the current, and not the current density for a deposition. Hope this helps, kind regards, Dirk
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