We bought the E-beam evaporation system without a loading chamber.
until now, we have used this system about 20~30 times for the deposition of Al2O3, Ti, Au, and Al having thicknesses from 50~100 nm.
Initially, the high vacuum was easily reached, but suddenly it took more than twice as long. When I first used it, I reached a high vacuum very quickly, but suddenly it took me more than twice as long to reach a high vacuum. The company explains that it is an outgas phenomenon, but I wonder if it can take a long time to reach a high vacuum so quickly.
If you deposit materials that weakly chemisorb or at least strongly physisorb water and other residuals, these are trapped on the chamber walls for quite a long time and thus increase the pumping duration.
In a worse scenario, if the rotor of your turbo pump is unprotected and you coat it, you may degrade your turbo over time.
I strongly suggest baking of the chamber using a heater which will help reaching ultra high vacuum quite easily with in the time frame.
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