Dear All,

I am trying to calculate specific capacitance of my Metal Oxide electrodes such as NiOx, AuOx, PtOx etc. From detailed discussion in literate I found following equation.

Equation 1.

Csp= Area under the CV curve/2(scan rate x voltage window x mass of the material)

In a typical CV we observe Faradaic regions including OER, HER, Metal redox reaction region some what in between OER and HER and non-faradaic region.

My question is for specific capacitance measurements what should be optimal potential window?

In some papers researchers are using metal redox region of CV later on integrating it, Some used metal redox region for metal oxide electrodes after subtracting oxidation and reduction peak integration from overall CV (redox region) integration.

I wonder why they are choosing redox region of CV???

Can we just use non-faradaic region rather than subtracting faradaic peak integration from total E/I integration curve?

Please give some details on selecting capacitive or charge accumulation region from CV curve.

Thank you in advance.

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