Dear all,
I'm trying to fabricate a SAW atomization device. In the literature i read, it's said that strong pyroelectricity of LiNbO3 makes it easy to shatter if we change suddenly temperature, which happens during photolitography.
So how should I procede to diminish the risk of shattering? What photoresist should I use (for etching or lift-off process)? Should I do Piranha reaction in cleaning step?
Best regards,
Nghia L.T.
The best way is ti use Black or Yellow LN substrate (pyroelectricity is removed by specific treatment). if not possible you need to maintain an homogenous température in both side of the substrate during processing step. For exemple use oven instead plate.
Regards.
Have you solved the problem of shattering of the LiNbO3 during photolitography？
Thank you for your help Mr. Omar, I succeeded in fabricating my SAW device without shattering the substrate. We don't have oven in our lab, so I used 3 different hot plates to slowly increase the temperature. I observed some discharges, but no shaterring.
Now I'm dealing with another problem. The photoresist S1813 sticks quite hard to my electrodes gold on LiNbO3 substrate. I used acetone and even left it in acetone for 3 days, but there are still a lot of resist on my electrodes.
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