When trying to find the dispersion relationship for plasmon supported by a noble metal thin film surrounded by an asymmetric dielectric environment, it is customary to postulate no incident field. Then, normally solving for a TM mode where the z direction is normal to the thin film, one writes down the appropriate fields with a purely imaginary Kz (field exponential decay away from the interfaces) and complex Kx. Finally applying the appropriate boundary conditions the dispersion relation for Kx and w (omega) is found, and Kx is usually complex, in particular for real metals.

In the same problem is solved with a transfer matrix approach, and the thin film is illuminated by a plane wave, one is able to launch a plasmon when the plane wave has appropriate frequency and momentum, i.e. Kx_pw=Re[Kx] and w_pw=w. In this approach Kx_pw is bound to be purely real; the consequences are twofold: (i) Kz_pw will be different from Kz since the characteristic equation to compute Kz is the same in both cases and Kx_pw is different from Kx (one real the other complex) (ii) the information about the plasmon propagation length (imaginary part of Kx) is completely lost.

The question is: how is it possible to reconcile these two different views of the same problem? Can you point me to some paper or book that tackle this problem?

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