Dear all researchers.
I have a problem in spin coating process. I make the inverted tandem organic solar cell.
The cell structure is: ITO/ZNO/Active layer/M-PEDOT:PSS/ZNO NP/Active layer/MoO3/Ag.
After coating the M-PEDOT:PSS layer, I anneal at 85C for 10 minutes and cool down for 30 minutes. Then I coat the ZnO NP layer via spin coating, but the ZnO NP just cover the rear of the substrate and leave the hole (uncovered part) in the middle of the substrate?. I had tried with different spin speed and different ZnO NP concentration, but it doesn't work.
Does anyone know how to solve this problem? Thank you very much.
I think there is no wetting of the solvent with M-pedot:pss surface. So, i propose to use a solvent that sticks to the surface of PEDOT:PSS.
You can use also an intermediate layer which can bond to both layer and having either high n or p-conductivity.
Best wishes
Annealing temperature plays vital rule for such tandem HJSC. you can try for different annealing temperature up to 130 C.
M-PEDOT:PSS is a water dispersed solution. Therefore to remove the water content after spin-coating PEDOT:PSS films, the annealing temperature should be 120 degree C to 140 degree C for 10 to 20 mins. The sovent used for the dispersion of ZnO nanoparticles is crucial to be able to cover on the top of PEDOT:PSS layer. I am not sure which sovent you used.
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