Hi all,

I am currently using AZ nLof2020 for metal lift off (which works great) without ultrasonic in acetone after 24 hours to 36 hours and have decided to use this photoresist for a dielectric like Al2O3, Ta2O5 and find it is not working very well.  It is almost like the photo-resist is forming an exoskeleton when removing with acetone.

When I used AZ 400T strip to remove instead of acetone, AZ 400T strip also does not work well. The photo-resist also becomes exoskeleton.

For my device, I cannot use ultrasonic to support the lift-off process, because ultrasonic damage graphene parts after 3s to 5s on my devices.

Any suggestions or experience with this problem. Or any kind of negative photo-resist can be dissolved easily by acetone.

Thank you so much,

More Vinh X Ho's questions See All
Similar questions and discussions