I have prepared different amount of TiO2 inside mesoporous silica by calcination process at 500 celcius temperature and found that the band gap is not same for prepared sample.
The amount of TiO2 affects the particles size, the bandgap of semiconductor depends on particle size due to quantization. See enclosed article, table 2. and fig. 6
I agree withe the comment of Dr. Alexander B. Shcherbakov, and added the calcinated of any catalyst that lead to aggregate then change the cryatal size and band gap.