I am fabricating Si solar cells with deposition of Ag (200 nm) by e-beam evaporation as the front electrode and Al (200 nm) as the back electrode by thermal evaporation. The sample was annealed at 500 C for 1 min after metal electrode deposition. However, everytime I get very low conversion efficiency due to the high series resistance. Does the series resistance depend on the thickness of the electrode ? If it is then thicker electrode is the only solution?? How can I solve this problem? Please help me.