Hello all,
I am using Trichloro(1H,1H,2H,2H-perfluorooctyl)silane for making a anti-stiction layer during PDMS-PDMS molding.
I am using Silane Vapor deposition technique (under vacuum desiccator). But during vacuum process, there may be a chance of "Silane vapor particle contamination residue to Vacuum pump".
How might I avoid this residue contamination? Should I use some intermediate absorption trap with NaOH (Not sure :( ).
Hi Charchit,
We normally do all of our silanization of SU8 masters in a desiccator attached to a vacuum line inside a chemical hood (probably safer than venting silane into the room). We do not worry about contamination to the pump system in this context as the building vacuum lines definitely have a trap of some sort. I have also seen systems set up where the users do not worry about contamination to the pump.... I'm not sure how bad that is for the pump, but I've seen those systems operated for years without pump failures.
When we degas that particular silane, we tend to pump down for ~20 min and then seal the desiccator. That may help reduce silane that leaves the chamber.
For other applications where we need to extract junk before it hits a vacuum pump, we have used mineral oil traps, or water traps. Not sure if that will help you.
Good luck!
D
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