I am working to use MoO3 as the hole transporting layer for perovskite solar cells. I deposited MoO3 on conductive glass ITO by evaporation. I'd like to know whether UV treatment is required before evaporation? What is the appropriate thickness and speed of evaporation? Thank you very much!
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Optimizing the combination of MoO 3 interface layer and low pressure plasma treatment on indium tin oxide (ITO) anode
Hello Yu Sun
It is good to use the UV-O3/plasma cleaning treatment of your ITO substrates before using them. We tried the thermal evaporation rate at 0.5 A/s, and it worked fine. For thickness, it is good to optimize for your system. The MoO3 thickness used was 5 nm or 10 nm in organic solar cells.
I hope it will help.
Dear Yu Sun,
https://www.sciencedirect.com/science/article/abs/pii/S0169433217316446?msclkid=058d781bb3f211ecb20e5101ae5eeb1f.
I hope this article will help you.
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