For solar cell application, TiO2 nanostructures can be grown on FTO glass coated with TiO2 compact layer (leaving some bare FTO at one edge for contact making). But during hydrothermal growth process, TiO2 are grown all over the substrate, including FTO. But for making contact, some bare FTO must remain exposed (not covered with any other layer).
Is there any way to get rid of the TiO2 from the FTO area?
try to use Teflon socket as attached or cover part of FTO substrate using PTFE (Teflon tape) or Cu tape from the beginning, or don't immerse FTO substrate completely in the solution.
try to use Teflon socket as attached or cover part of FTO substrate using PTFE (Teflon tape) or Cu tape from the beginning, or don't immerse FTO substrate completely in the solution.
Try to use the lithography process and then use acid to etch the portion you need. But the the best way is the one that Elbaz have mentioned.
It is better not to use acid! Actually, acids can fastly remove conductive oxide coatings like FTO, ITO and similars!!
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