We have a single langmuir probe reactor system to generate plasma discharge in lab which works on AC/DC supply. Projects have been done under the system before. Now I'd like to work for RF mode supply. How to make a RF power supply for the reactor system? What are the criteria for the supply system? Has anyone worked on it before?
For the specifications of the rf power supplies for plasma discharge please refer to the data sheet in the link:http://www.ulvac.co.jp/data/catalogue_dl/data/components/2455E_RFSN.pdf
They are characterized by an operating rf frequency of 13.6 MHz,
output rf power of up to 1000 watt, in 50 ohm load.
Naturally there are different brands from different vendors.
They are built from a crystal oscillator and high efficiency rf amplifiers.
Best wishes
Several semiconductor manufacturers have reference designs and kits available for inexpensive RF generators that are suitable for plasma discharges.
Here are a couple that I have found useful:
https://www.ixys.com/Documents/AppNotes/CO1.pdf
https://www.microsemi.com/document-portal/doc_view/123626-drf1200-27-12mhz-reference-design-kit
Regards
Pay attention to IXYS products. Among the activities of the company there are radio frequency drivers and transistors that allow creating inverters for frequencies up to 27 MHz. There are relevant articles describing such converters
Hi...!!
You can create plasma with 40 kHz - 400 kHz push pull type inverter which can be applied to filament inside the chamber (single probe in your case) or an inductive coupled ring on vacuum chamber , In case you need higher frequency depending upon power solid state converters upto 27 MHz are available in market,where 13 MHz converter are widely used for plasma applications. Solid state AM(800-1100 kHz) transmitter modules can also be used.
A plurality of electrode bars are arranged in parallel with each other, and side electrode bars are connected to the corresponding opposite ends of the electrode bars, thereby forming a ladder-like RF discharge electrode. Power supply points are arranged axisymmetrically with respect to a reference line, which is a bisector which bisects one side of the RF discharge electrode, while being spaced a predetermined distance from the reference line, thereby suppressing voltage distribution on the ladder electrode, which has an effect on uniformity of discharge distribution, to a sufficiently low level of nonuniformity. Thus, uniform distribution of film deposition rate can be obtained, thereby enabling uniform deposition even in large-area applications.
Hi. I would like to know why did you shift from AC/DC supply to RF mode supply? Could you please guide about any significant difference it can cause on plasma-based surface modification? Reema Shrestha
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