Dear All,
Presently, I am doing the 'bake-out' process of our ultra high vacuum (UHV) system. It consists of turbo pump (backed by a rotary pump), ion pump and titanium sublimation pump (TSP). Our system was in ambient condition (in air) for a very long period (more than six months).
With aim to get back UHV, we have started 'bake-out' of the whole system. During bake-out process at 110 deg C for 12 hours, UHV chamber has been pumped out by turbo pump (ion pump was off). After baking is over, we achieve extremely good base pressure of the chamber as ~ 1.8 * 10 -8 Torr. Then, as the ion pump is switched on, we observe the excessive degassing of the ion pump. When bias voltage in ion pump is reached 7.0 kV, the ion pump gauge shows the pressure as 6.0 * 10 -7 Torr. It is not improved significantly after waiting for several hours also. While other gauge of the UHV chamber (which is far away from ion pump) shows the base pressure as ~ 5.0 * 10 -8 Torr.
It indicates, due to exposure of UHV chamber in air , inner wall of the ion pump has been excessively contaminated.
Can you kindly suggest to resolve this issue ?
Thanking you.
Anjan