24 February 2021 5 4K Report

I need to clean the hydrocarbon contamination on the carbon substrate of TEM grid.

However, I heard that substrate could be broken by the powerful plasma.

My substrate is pure carbon, with ~3nm, ~5nm, and ~10nm.

The cleaner which I plan to use is GATAN Solarus Plasma Cleaner.

So, which gas is prefer to use? Ar? O2? H2? I heard that use the mixed gas, but which mixture is prefer?

And how long do I need to expose them under plasma?

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