Dear colleagues:
When you have an Aluminum plate, and then, lets say you sand its surface with a sandpaper, you remove its native Al2O3 thin layer previously formed on the surface.
Instantly, after you remove it ,the Al2O3 quickly grow again, due to the exposure to the Oxygen on the room environment.
Does anyone know What is the Growth Rate of this thin film ? and, What is roughly the film's thickness achieved by this process at a regular room atmosphere?
Thanks all !
Dear Franklin Uriel Parás Hernández, Aluminium is a nonferrous metal. Once it is oxidized, the formed oxide is tough and less dense. It forms a protecting thin film that mitigate the normal course of oxidation. So, one may expect a declining rate with time évolution. My Regards
dear Franklin Uriel Parás Hernández;
The aluminum oxide layer is a porous structure with a hexagonal pore arrangement. The thickness of the film linearly depends on the cell voltage oxide depends on the metal and the conditions under which it has been oxidized. the average thickness of the aluminum oxide formed on {100} and {111} surfaces as a function of oxygen pressure (3 × 10–5, 3 × 10–6, and 3 × 10–7 Torr) is about 2- 2.5 nm. More details of measuring growth rate are shown in the reference;
Article Atomic-Scale Insights into the Oxidation of Aluminum
Dear Abdelkader BOUAZIZ :
The scientific articles are very interesting, and relevant indeed. Would you have a more practical number about the common expected Growth Rate at the first stages, for an Aluminum surface in room ambient conditions ? and;
Normally, What is the Al2O3-layer thickness achieved (also in room ambient conditions) when the reaction has arrived close to the equilibrium point
Dear Mahmood Hameed M. :
I see sir, I'm interested in this data, but for the case of the oxidation of an Aluminum surface in room ambient conditions. (The case of sponteneous reaction with the oxygen in the air). Would you have any idea around what is the achieved film-thickness in this scenario ?
Thanks,
Regards ! :)
Dear Franklin Uriel Parás Hernández ;
according to some references it was reported the thickness of oxide film on Aluminum is from 1 to 10 nm.
for more details can read the references:
H.P. Goddard, Mater. Perform. 20 (7) (1981) 9;
R.W. Revie, H.H. Uhlig, Corrosion and Corrosion Control, fourth ed., John Wiley & Sons, New Jersey, 2008;
R.W. Revie, Uhlig’s Corrosion Handbook, third ed., John Wiley & Sons, New Jersey, 2011.
Dear all, many values are available but all these depend on the specific conditions the metal is subjected to. For exemple 10 and 150nm are given by some authors. These RG links and the attached file discuss question in the same direction. My Regards
https://www.researchgate.net/post/How_can_I_convert_aluminium_thin_film_to_aluminium_oxide_thin_film/amp
https://www.researchgate.net/post/How_thick_is_the_Aluminum_Oxide_Layer_on_Aluminum/amp
It is generally believed that the thickness of the Al2O3 film on the Al surface is 2-5 nm. Maybe you will find something useful in these articles:
1. Starodub, D., Gustafsson, T., & Garfunkel, E. (2004). The reaction of O2 with Al(110): a medium energy ion scattering study of nano-scale oxidation, Surface Science, vol. 552, pp. 199-214 (. doi: 10.1016/j.susc.2004.01.019 .
2. Barrie, A. (1973). X-ray photoelectron spectra of aluminium and oxidised aluminium. Chemical Physics Letters, 19(1), 109–113. doi:10.1016/0009-2614(73)87074-5
3. Do, T., Splinter, S. J., Chen, C., & McIntyre, N. S. (1997). The oxidation kinetics of Mg and Al surfaces studied by AES and XPS. Surface Science, 387(1-3), 192–198. doi:10.1016/s0039-6028(97)00351-8
4. Chen, C., Splinter, S. J., Do, T., & McIntyre, N. S. (1997). Measurement of oxide film growth on Mg and Al surfaces over extended periods using XPS. Surface Science, 382(1-3), L652–L657. doi:10.1016/s0039-6028(97)00054-x
5. Gartland, P. O. (1977). Adsorption of oxygen on clean single crystal faces of aluminium. Surface Science, 62(1), 183–196. doi:10.1016/0039-6028(77)90436-8
Thank you Sir Kamil M. :
I will review the recommended articles
Thanks !
The natural Al2O3 grown on Al is irregular and weak. Its thickness is a few microns (not like Al2O3 grown by electro-chemical process which gives a regular width of 3000-5000 angstroms). The layer is time, humidity and temperature dependent. it grows quickly on the surface within few hours.
Dear Alisa Buchman :
So the Al2O3 layer grown by an Electrodeposition process gets terminated normally between 300 and 500 nm ?
Regards !
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