What precursor do I use for this layers and how can the high temperature step be avoided?
Sayan Saha
You can use ALD TiO2 deposition using tetrakis-dimethyl-amido titanium or Ti isopropoxide precursors and H2O. the reference to look at - http://scitation.aip.org/content/aip/journal/jap/102/8/10.1063/1.2798384.
Alternatively you can use e-beam evaporation of 1-2nm of Ti and oxidize it by exposure to air and repeat. the reference to look at -
http://pubs.acs.org/doi/abs/10.1021/nn5038509
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