I am planning to grow certain metal oxide films using chemical vapor deposition. For that, I need any single crystalline (110) substrate. Due to the non-availability of such material here. I am seeking an alternate option and trying to grow single crystalline rutile (110) film on Alumina and Silicon wafers. I will use this single crystalline rutile thin film as a substrate for the particular metal oxide thin film.
So far I tried the following methods but didn't get fruitful results.
- Deposited the TiO2 using RF Magnetron Sputtering. I used a direct approach using the TiO2 target with Ar as a working gas rather than reactive sputtering using O2. But using this method I failed to maintain stoichiometry (due to different sputtering thresholds of Ti and Oxygen). Even by annealing, I got brookite instead of Single crystal rutile.
- I deposited Titanium using DC magnetron sputtering on alumina. After that, I annealed it in presence of pure oxygen at 680 Celcius. This time I got rutile film but it was polycrystalline.
Any suggestions or Literature recommendations will be appreciated.
Sincerely.
Aditya Chauhan
Let me know once you have solved this and I will tell you how to make a lot of money from it. ;)
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