I am fabricating PDMS waveguides by soft lithography using silicon mold chips which I structure in clean room.
I face two problems :
Firstly, after dicing the wafer in the clean room, there are millions of micro sized silicon wafer particles which deposit in the waveguide cavities. How can I clean them up?
I tried ultrasonic in DI water, it works good enough (not absolutely good), but ultrasonic also breaks off the C4F8 anti stiction layer which is necessary to good demolding.
Secondly, after pouring the PDMS onto the silicon wafer mold and curing the PDMS, the wafer has to be cleaved and peeled off from the PDMS layer. this again leaves behind lots of silicon particles which stick to the cured PDMS. I tried cleaning the PDMS structures with Isopropanol or with DI water in ultrasonic, but the silicon particles just won't leave the PDMS. What can I use to clean up the small particles sticking to the PDMS?
Thank you .