I am having a lot of difficulty characterizing the raman spectroscopy of the mica substrate. Which laser power source should be used when characterizing the mica substrate raman? I tried to take measurements using a 532nm laser source and a 3-20 mW power supply, I can't get any results, what can I do?
532nm and 3-20 mW should be fine. Are you getting signals from anything else? Silicon? Polystyrene (e.g. Petri dish)?
yes, under these conditions Si/SiO2 base or sapphire substrate can be measured while mica is burning or not measuring.
Ok- is it very thin?
If it is burning, then you should try to reduce the thermal build up-
If you have an immersion objective, measuring in water provides a heat sink.
Alternatively mount it on a metal surface
I'm guessing you are using a pulsed 532 nm system, not CW. Absorption impurities in the mica are probably getting burned by the high peak power. Si/SiO2 are much better at dealing with heat. Can you get a Raman spectrum from polystyrene or does it burn as well? I use a micro Raman system with similar power levels with a CW 532 nm source and it isn't a problem.
Ayca Coskun - if it is burning, it must be heating up, so you should try to stop it heating up, by putting it in contact with something that will conduct the heat away.
This could be a metal plate underneath..... or if you have a water immesion objective (which dips into the water and measures a sample immersed in it) you could use this technique.
Is the mica very thin? do you know how thick?
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