I was trying to attach gold NPs on silicon using laser but it was not effective, also I was reading about the use of thiol but it has been really difficult to get, anyone has another idea.
What has been tried to make a metal contact in silicon was to deposit a thin chromium layer (transition layer) followed by copper and then by gold. All metal deposition is via sputtering in an inert chamber. You may want to consult IBM papers from decades ago regarding actual thicknesses and sputtering conditions. I am thinking the same may work with nanoparticles of Au with some modifications?
If you have a clean hydrogenated silicon surface, there is a good chance you can use disiladecane, simply dipping the wafer at room temp for an hour. I have attached an article entitled hydridosilane modification of metals that provides background.