Could anyone suggest the most effective industrial method to reduce the particle size of Si₃N₄ powder (currently 3 µm) for use in tape casting of silicon nitride substrates?
For industrial-scale reduction of Si₃N₄ powder from 3 µm to finer sizes suitable for tape casting, wet ball milling is typically one of the most effective methods, as it is scalable, relatively cost-effective, and allows for good control over particle size distribution. You can use a dispersant in the milling medium to prevent agglomeration and achieve a uniform dispersion of the fine powder.
Alternatively, if finer particle sizes (in the sub-micron or nano range) are required, jet milling or high-energy ball milling could be considered, though these methods may involve higher operational costs and more complex equipment.
Finally, ensure that the powder is well-dispersed in the slurry for tape casting to prevent defects in the final silicon nitride substrate.
Best Choice: Wet Ball Milling or Attrition Milling for industrial scale due to cost-effectiveness and ability to control particle size.
Tips: Use dispersants (e.g., PVA, PAA) to prevent agglomeration and ensure slurry stability for tape casting. Optimize milling parameters to avoid contamination.
Exactly!.... I really appreciate your recommendation.... I worked with high frequency and intensity ultrasonic testing and characterisation. But definitely I know that this low frequency and high intensity app. 1000 Watts would be useful for this particle size reduction.
Arun's answer is pretty good. Do some library and patent rearch. you will find lots of patents on ball-miliing of carbides and nitrides including silicon nitride.